Photocurable composition for making layers with high etch resistance
AssigneeCanon Kabushiki Kaisha
InventorsFen Wan, Weijun Liu
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Abstract
A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise at least one acrylate monomer including at least one cyano group (CN-acrylate monomer). The presence of a low amount of the CN-acrylate monomer between 10 wt % and not greater than 30 wt % can lower the contact angle of the composition and may improve the etch resistance of a photo-cured layer made from the photocurable composition.
Claims17
A photocurable composition comprising a polymerizable material and a photoinitiator, wherein
- the polymerizable material comprises at least one acrylate monomer including at least one cyano group (CN-acrylate monomer);
- an amount of the CN-acrylate monomer is at least 5 wt % and not greater than 30 wt % based on the total weight of the polymerizable material;
- and
- a contact angle of the photocurable composition to a SiO2 surface is not greater than 19.5 degrees,
- and wherein the CN-acrylate monomer includes a monomer of formula (1), with R1 being H or one ore more alkyl substitutions, and R2 being H or alkyl
A method of forming a photo-cured layer on a substrate, comprising:
- applying a layer of a photocurable composition on the substrate, the photocurable composition comprises a polymerizable material and a photoinitiator, wherein the polymerizable material comprises at least one acrylate monomer including at least one cyano group (CN-acrylate monomer), an amount of the CN-acrylate monomer is at least 5 wt % and not greater than 30 wt %;
- and a contact angle of the photocurable composition to a SiO2 surface is not greater than 19.5 degrees;
- bringing the photocurable composition into contact with a superstrate;
- irradiating the photocurable composition with light to form a photo-cured layer;
- and
- removing the superstrate from the photo-cured layer,
- wherein the CN acrylate monomer includes a CN acrylate monomer of formula (1), with R1 being one ore more alkyl substitutions and R2 being H or alkyl,
A method of manufacturing an article, comprising:
- applying a layer of a photocurable composition on a substrate, wherein the photocurable composition comprises a polymerizable material and a photoinitiator, the polymerizable material comprising at least one acrylate monomer including at least one cyano group (CN-acrylate monomer), an amount of the CN-acrylate monomer is at least 5 wt % and not greater than 30 wt %, and a contact angle of the photocurable composition to a SiO2 surface is not greater than 19.5 degrees;
- bringing the photocurable composition into contact with a superstrate;
- irradiating the photocurable composition with light to form a photo-cured layer;
- removing the superstrate from the photo-cured layer;
- forming a pattern on the substrate;
- processing the substrate on which the pattern has been formed in the forming;
- and
- manufacturing an article from the substrate processed in the processing,
- wherein the CN acrylate monomer includes a CN acrylate monomer of formula (1), with R1 being H or one ore more alkyl substitutions and R2 being H or alkyl,
Dependencies are inferred from the claim text.