Methods and systems for zero liquid discharge recycling of waste generated from manufacturing operations
AssigneeGreenSource Fabrication LLC
InventorAlexander Slavomir Stepinski
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Abstract
A method and system is provided for treating waste generated from manufacturing operations including at least one of Printed Circuit Boards Fabrication (PCB FAB), General Metal Finishing (GMF), semiconductors manufacturing, chemical milling, and Physical Vapour Deposition (PVD). The method and system are used to create zero liquid discharge recycling.
Claims11
A system for treating waste generated by manufacturing operations, the waste being at least one of rinse-water waste, concentrate waste, and film and mask developer waste, the system comprising a plurality of modules to treat rinse-water waste, and a plurality of modules to treat concentrate waste and film and mask developer waste, wherein the system comprises a plurality of conduits to provide communication between the plurality of modules to treat rinse-water waste and the plurality of modules to treat concentrate waste and film and mask developer waste;
- and wherein the plurality of modules to treat the rinse-water waste comprises an ion exchange feed tank, a first granular activated carbon (GAC) column, a copper selective ion exchange column, a membrane-based separation module, an advanced oxidation process (AOP) tank, second and third GAC columns, and a plurality of bag filters.
A method for treating waste generated by manufacturing operations, the waste being at least one of rinse-water waste, concentrate waste, and film and mask developer waste, the method comprising receiving and processing the at least one of the rinse-water waste, the concentrate waste, and the film and mask developer waste;
- wherein the step of receiving and processing the at least one of the rinse-water waste, the concentrate waste, and the film and mask developer waste comprises passing the rinse-water waste through a plurality of modules to generate ultra-pure water;
- wherein the step of receiving and processing the at least one of the rinse-water waste, the concentrate waste, and the film and mask developer waste comprises the step of passing the concentrate waste through a plurality of modules to generate solid waste, and passing the film and mask developer waste through a plurality of modules to generate solid waste;
- and wherein the step of passing the rinse-water waste through a plurality of modules to generate ultra-pure water comprises the step of receiving the rinse-water waste by an ion exchange feed tank;
- wherein the step of receiving and processing the at least one of the rinse-water waste, the concentrate waste, and the film and mask developer waste comprises passing the rinse-water waste through a plurality of modules to generate ultra-pure water;
- wherein the step of receiving and processing the at least one of the rinse-water waste, the concentrate waste, and the film and mask developer waste comprises the step of passing the concentrate waste through a plurality of modules to generate solid waste, and passing the film and mask developer waste through a plurality of modules to generate solid waste- and passing the film and mask developer waste through a plurality of modules to generate solid waste;
- wherein the step of passing the rinse-water waste through a plurality of modules to generate ultra-pure water comprises the step of receiving the rinse-water waste by an ion exchange feed tank.
Dependencies are inferred from the claim text.