Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin

A resist underlayer film-forming composition for lithography comprising:

• a polymer having a unit structure of Formula (1):
• wherein:
• A is a benzenediol group, a benzenetriol group, or a naphthalenediol group;
• B is a C6-40 arylene group and is an organic group based on a benzene ring, a naphthalene ring, or an anthracene ring, or an organic group based on a fluorene ring bonded to T, or a C4-30 heterocyclic group containing a nitrogen atom, an oxygen atom, a sulfur atom, or a combination thereof and is an organic group based on an optionally substituted furan ring, thiophene ring, pyrrole ring, carbazole ring, or dibenzofuran ring;
• X+ is H+, NH4+, a primary ammonium ion, a secondary ammonium ion, a tertiary ammonium ion, or a quaternary ammonium ion,
• T is a hydrogen atom, a C1-10 alkyl group or a C6-40 aryl group that may be substituted with a halogen group, a hydroxy group, a nitro group, an amino group, a carboxylate ester group, a nitrile group, or a combination thereof as a substituent, or a C4-30 heterocyclic group containing a nitrogen atom, an oxygen atom, a sulfur atom, or a combination thereof,
• B and T may form a C4-40 ring together with a carbon atom to which they are bonded, and n1 is an integer of 1 to the number of group(s) capable of being substituted with hydrogen atom(s) in the group defined by B or hydrogen atom(s) in the ring formed by bonding B and T, and
• a crosslinker,
• wherein the composition has a solid content of 0.1 to 70% by mass,
• wherein a cured resist underlayer film formed from the resist underlayer film-forming composition after baking at 240° C. for 1 minute is not soluble when immersed in a photoresist solvent composed of propylene glycol monomethyl ether or propylene glycol monomethyl ether acetate but is removable when immersed in an aqueous solution of tetramethylammonium hydroxide and without ashing, and
• wherein the polymer having a unit structure of Formula (1) is a polymer having a unit structure corresponding to the following Formula (1-1):