Method for manufacturing polycrystalline silicon fragment and polycrystalline silicon block fracture device

A polycrystalline silicon block fracture device, comprising:

• a fracturing part mechanically fracturing a polycrystalline silicon block material introduced from a material introduction port by a movement of an outside force loading member to produce a polycrystalline silicon fragment including a polycrystalline silicon powder having a particle size of 500 to 1000 μm then discharging from a discharging port,
• a falling movement part continuous with a downstream of said fracturing part allowing said polycrystalline silicon fragment discharged from the discharging port to fall by gravity,
• a receiver part positioned at downstream of said falling movement part and receives said polycrystalline silicon fragment after falling through said falling movement part,
• a sliding dust suction part suctioning a sliding dust generated by a sliding part which slides together with the movement of said outside force loading member;
• and
• said falling movement part comprises a suction removing part in which at least part of said polycrystalline silicon powder included in said polycrystalline silicon fragment is removed by suctioning to a different direction from said falling direction,
• wherein an amount of said polycrystalline silicon fragment is supplied to said falling movement part at 20 to 160 g/min per unit area, cm2, of said falling movement part, and said suction removing part suctions at a suction rate of 1 to 20 m3/min.