Chemical solution evaporation device and substrate processing device including the same

A chemical solution vaporization device comprising:

• a chemical solution tank comprising a plurality of chemical solution vaporization rooms, a chemical solution sensing room, and a chemical solution supply room;
• a chemical solution supply unit configured to supply a chemical solution to the chemical solution supply room;
• a bubbler configured to supply a vaporization gas into the chemical solution stored in the plurality of chemical solution vaporization rooms, the bubbler comprising:
• a vaporization gas injector providing a path in which the vaporization gas moves;
• and
• a vaporization gas discharger comprising a vaporization gas discharge group comprising a plurality of vaporization gas discharge holes in a radial shape having a constant distance from a center portion of the vaporization gas injector on an upper surface thereof, the vaporization gas discharger configured to discharge the vaporization gas into the chemical solution;
• and
• a level sensor in the chemical solution sensing room and configured to sense a level of the chemical solution.

A substrate processing device comprising:

• a spin chuck configured to rotate a substrate;
• a chemical solution vaporization device configured to generate a processing gas by vaporizing a chemical solution, the chemical solution vaporization device comprising:
• a chemical solution tank comprising a lower wall, first through fourth internal walls, and an external wall defining a plurality of chemical solution vaporization rooms, a chemical solution sensing room, and a chemical solution supply room, wherein:
• the first internal wall is configured to separate the plurality of chemical solution vaporization rooms from each other and comprises a first opening at a lower portion thereof,
• the second internal wall is configured to separate at least one of the plurality of chemical solution vaporization rooms from the chemical solution supply room and comprises a second opening at a lower portion thereof,
• the third internal wall is configured to separate at least one of the plurality of chemical solution vaporization rooms from the chemical solution sensing room and comprises a third opening at a lower portion thereof, and
• a lower portion of the fourth internal wall is configured to separate the chemical solution sensing room from the chemical solution supply room and is coupled with the lower wall;
• a chemical solution supply unit configured to supply the chemical solution to the chemical solution supply room;
• a bubbler configured to supply a vaporization gas for vaporizing the chemical solution into the chemical solution stored in the plurality of chemical solution vaporization rooms;
• and
• a level sensor in the chemical solution sensing room, the level sensor configured to sense a level of the chemical solution;
• and
• a processing gas coating device configured to apply the processing gas delivered from the chemical solution vaporization device onto the substrate.