Electrodynamic mass analysis with RF biased ion source

A system, comprising:

• an ion source including a power supply, the ion source operable to generate a plasma within a chamber housing;
• an extraction power assembly including a first power supply and a second power supply each independently and directly electrically coupled with the chamber housing of the ion source, wherein the first power supply and the second power supply are operable to bias the chamber housing of the ion source with a time modulated voltage to extract an ion beam from the ion source;
• an electrodynamic mass analysis (EDMA) assembly operable to receive the ion beam, and perform mass analysis on the ion beam;
• and
• an electrostatic filter positioned downstream of the EDMA assembly, the electrostatic filter operable to receive the ion beam directly from the EDMA assembly, the electrostatic filter including a first plurality of electrodes disposed along a first side of the ion beam and a second plurality of electrodes disposed along a second side of the ion beam.