Method for calibrating plurality of chamber pressure sensors and substrate processing system

A substrate processing system comprising:

• a plurality of chambers;
• a plurality of chamber pressure sensors provided to measure pressures in the plurality of chambers, respectively;
• a plurality of gas supply units each configured to supply a gas to an internal space of a corresponding chamber among the plurality of chambers and each including
• a flow rate controller,
• a primary valve connected to a primary side of the flow rate controller,
• a secondary valve connected to a secondary side of the flow rate controller, and
• a first gas flow channel including a first end, a second end, and a third end, the first end being connected to the secondary valve and the third end being connectable to the internal space of the corresponding chamber,
• a plurality of exhaust apparatuses connected to internal spaces of the plurality of chambers through a plurality of exhaust flow channels, respectively;
• a second gas flow channel connected to the second end of each of the plurality of gas supply units;
• a reference pressure sensor provided to measure a pressure in the second gas flow channel;
• and
• a controller configured to perform control for calibration of the plurality of chamber pressure sensors,
• wherein the controller is configured to perform:
• a first control of controlling a selected gas supply unit among the plurality of gas supply units or an other gas supply unit to form a state where a pressure is maintained in a selected space including the first gas flow channel of the selected gas supply unit, the second gas flow channel, and the internal space of a selected chamber corresponding to the selected gas supply unit among the plurality of chambers by using a gas supplied from the selected gas supply unit or the other gas supply unit at a set pressure;
• a second control of controlling a selected chamber pressure sensor for the selected chamber among the plurality of chamber pressure sensors to acquire a plurality of first pressure measurement values which are measurement values of the pressure in the selected chamber in the state;
• a third control of controlling the reference pressure sensor to acquire a plurality of second pressure measurement values which are measurement values of the pressure in the second gas flow channel in the state;
• calibration of the selected chamber pressure sensor to eliminate a difference between a pressure measurement value of the selected chamber pressure sensor, which is equal to an average value of the plurality of first pressure measurement values, and an average value of the plurality of second pressure measurement values;
• and
• repetition of control sequence including the first control, the second control, the third control, and the calibration of the selected chamber pressure sensor by selecting the plurality of chamber pressure sensors in order as the selected chamber pressure sensor and using a plurality of different set pressures as the set pressure, respectively.