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US 11,583,810 B2Granted
Porous substrate structure and manufacturing method thereof
AssigneeIndustrial Technology Research Institute
InventorsChun-Ju Huang, Yen-Hsun Chi, Bing-Hung Chang
Life of this patent
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Abstract
Provided are a porous substrate structure and a manufacturing method thereof. The porous substrate structure includes a substrate, an anodic aluminum oxide layer and a double metal oxide layer. The substrate has a plurality of pores. The anodic aluminum oxide layer is disposed on the substrate. The double metal oxide layer is disposed on the anodic aluminum oxide layer.
Claims15
A porous substrate structure, comprising:
- a substrate, having a plurality of pores;
- an anodic aluminum oxide layer, disposed on the substrate;
- and
- a double metal oxide layer, disposed on the anodic aluminum oxide layer,
- wherein the double metal oxide layer comprise layered double metal oxide represented by Formula 1,
- [MII1-xMIIIx]Oy Formula 1
- wherein MII is Mg2+, Zn2+, Fe2+, Ni2+, Co2+, Cu2+ or Li+;
- MIII is Al3+, Cr3+, Fe3+ or Sc3+;
- x is between 0.2 and 0.33;
- and y is between 0.7 and 2.
7 more elements
A manufacturing method of a porous substrate structure, comprising:
- forming an anodic aluminum oxide layer on a substrate, wherein the substrate has a plurality of pores;
- and
- forming a double metal oxide layer on the anodic aluminum oxide layer,
- wherein the double metal oxide layer comprise layered double metal oxide represented by Formula 1,
- [MII1-xMIIIx]Oy Formula 1
- wherein MII is Mg2+, Zn2+, Fe2+, Ni2+, Co2+, Cu2+ or Li+;
- MIII is Al3+, Cr3+, Fe3+ or Sc3+;
- x is between 0.2 and 0.33;
- and y is between 0.7 and 2.
6 more elements
Dependencies are inferred from the claim text.