Characterization of an electron beam
AssigneeExcillum AB
InventorsPer Takman, Tomi Tuohimaa, Ulf Lundström
Life of this patent
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Abstract
A method for characterizing an electron beam in a liquid metal jet X-ray source. The method includes providing the electron beam and directing the electron beam to an interaction region; providing an electron beam dump connected to ground potential for receiving the electron beam after it has traversed the interaction region; scanning the electron beam over at least part of the interaction region; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile. Also a corresponding liquid metal jet X-ray source.
Claims15
A method for characterizing an electron beam in a liquid metal jet X-ray source, comprising
- providing said electron beam and directing said electron beam to an interaction region;
- providing an electron beam dump connected to ground potential for receiving said electron beam after it has traversed said interaction region;
- scanning said electron beam over at least part of said interaction region;
- measuring X-ray radiation generated by interaction between said electron beam and said electron beam dump during said scanning to obtain an X-ray profile;
- and
- calculating an electron beam characteristic based on said X-ray profile.
A liquid metal jet X-ray source, comprising:
- an electron source arranged for providing an electron beam and directing said electron beam to an interaction region;
- an electron beam dump connected to ground potential, said electron beam dump being arranged for receiving the electron beam after it has traversed said interaction region;
- a scanning arrangement capable of scanning said electron beam over at least part of said interaction region;
- an X-ray sensor positioned and arranged to detect X-ray radiation generated by interaction between said electron beam and said electron beam dump;
- and
- circuitry operatively connected to said scanning arrangement and to said X-ray sensor, said circuitry being configured to determine an X-ray profile during scanning of said electron beam.
Dependencies are inferred from the claim text.