Surfactant composition
AssigneeDai-Ichi Kogyo Seiyaku Co., Ltd.
InventorsMasatake Joyabu, Kei Shiohara, Asako Ogasawara, Takuro Kimura, Chi Tao
Life of this patent
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Abstract
The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R1 represents one or two groups selected from groups below, D1 represents a polymerizable unsaturated group represented by chemical formula D1-1 or D1-2 below, R2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.
Claims5
A surfactant composition, comprising:
- a surfactant (A) represented by the formula (1) below;
- and
- an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A),
- wherein D1 is a polymerizable unsaturated group represented by the formula D1-1 or D1 2 below,
- wherein R2 is a hydrogen atom or a methyl group,
- R1 is one or two groups selected from the groups below,
- m1 and m2 are each 1 to 2 on average in the entirety of the surfactant (A),
- A1 is an alkylene group with 2 to 4 carbon atoms, and
- m3 represents an average number of moles of the oxyalkylene group A1O and is in a range of from 1 to 100, and
- wherein a mass ratio (A/B) of the surfactant (A) to the anionic surfactant (B) is from 4/6 to 2/8.
Dependencies are inferred from the claim text.