Methods and apparatuses for adjusting beam condition of charged particles
AssigneeASML Netherlands B.V.
InventorXuedong Liu
Life of this patent
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Abstract
Apparatus and methods for adjusting beam condition of charged particles are disclosed. According to certain embodiments, the apparatus includes one or more first multipole lenses displaced above an aperture, the one or more first multipole lenses being configured to adjust a beam current of a charged-particle beam passing through the aperture. The apparatus also includes one or more second multipole lenses displaced below the aperture, the one or more second multipole lenses being configured to adjust at least one of a spot size and a spot shape of the beam.
Claims15
An apparatus comprising:
- one or more first multipole lenses displaced above an aperture, the one or more first multipole lenses being configured to adjust a beam current of a charged-particle beam passing through the aperture by changing an outer contour of the charged-particle beam above the aperture;
- and
- one or more second multipole lenses displaced below the aperture, the one or more second multipole lenses being configured to adjust at least one of a spot size and a spot shape of the beam.
A method comprising:
- adjusting, by one or more first multipole lenses displaced above an aperture, a beam current of a charged-particle beam passing through the aperture by changing an outer contour of the charged-particle beam above the aperture;
- and
- adjusting, by one or more second multipole lenses displaced below the aperture, at least one of a spot size or a spot shape of the beam.
A non-transitory computer-readable medium storing instructions that, when executed by one or more processors, cause the processors to perform a method comprising:
- controlling one or more first multipole lenses displaced above an aperture, to adjust a beam current of a charged-particle beam passing through the aperture by changing an outer contour of the charged-particle beam above the aperture;
- and
- controlling one or more second multipole lenses displaced below the aperture, to adjust at least one of a spot size or a spot shape of the beam.
Dependencies are inferred from the claim text.