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US 11,566,356 B2Granted
Patch library system for stitching along a predetermined path
AssigneeRAD LAB 1, Inc.
InventorRobert S. Blenis, Jr.
Life of this patent
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Abstract
Disclosed are various systems and features for use with a machine, such as a sewing machine, to facilitate patch library systems that may enable the storage and retrieval of patch configuration information. Such systems and features may be useful in the context of performing an action along a self-guided path on a substrate.
Claims20
A method for performing operations of a guiding apparatus, the method comprising:
- storing patch configuration information, the patch configuration information comprising instructions for performing actions along predetermined paths;
- and
- instructing the guiding apparatus to perform the actions along predetermined paths within an operational area of the guiding apparatus stored in the patch configuration information.
A computer-readable medium comprising a set of instructions, which when executed, perform a method for performing sewing process, the method comprising:
- determining location information associated with a position of at least one patch disposed on a surface of a substrate in an operational area of a guiding apparatus, and visual features of at least one of:
- an edge of the at least one patch and an interior feature of the at least one patch;
- and
- sewing the at least one patch according to patch configuration information in a patch library matching at least one of:
- the location information of the at least one patch and visual features of the at least one patch.
2 more elements
Dependencies are inferred from the claim text.