Method for manufacturing light absorber
AssigneeNational Institute of Advanced Industrial Science and Technology
InventorKuniaki Amemiya
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Abstract
This method for manufacturing a light absorber includes: a first step for irradiating a resin substrate with ion beams; a second step for etching the irradiated resin substrate with an alkaline solution to form an uneven surface on the surface thereof; a third step for forming a transfer body which covers the uneven surface of the etched resin substrate; and a fourth step for peeling off the transfer body from the resin substrate to obtain a light absorber. A metal film, a photocurable resin, and a silicone rubber are disclosed as an example of the transfer body.
Claims20
A method for manufacturing a light absorber, comprising:
- a first step of irradiating a resin substrate with an ion beam;
- a second step of etching the irradiated resin substrate with an alkaline solution to form an uneven surface on its surface, wherein the uneven surface formed by the first and second steps has a total reflectance of 0.1% or less at wavelengths of 4 μm to 15 μm;
- a third step of forming a transfer body which covers the uneven surface of the etched resin substrate;
- and
- a fourth step of peeling off the transfer body from the resin substrate to obtain a light absorber,
- wherein the ion beam has an acceleration energy of 200 MeV or more and 260 MeV or less and wherein the ion beam includes either Ne ions or ions heavier than Ne ions.
Dependencies are inferred from the claim text.