Back to results
US 11,560,009 B2Granted
Stamps including a self-assembled block copolymer material, and related methods
AssigneeMicron Technology, Inc.
InventorsDan B. Millward, Gurtej S. Sandhu
Life of this patent
Estimating the term…
Abstract
Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.
Claims20
A stamp, comprising:
- a trench in a material overlying a structure and comprising:
- an unpatterned, neutral wetting floor;
- opposing preferential wetting ends;
- and
- opposing parallel preferential wetting sidewalls, a fixed width separating the opposing parallel preferential wetting sidewalls;
- and
- a self-assembled block copolymer material filling the trench and having an inherent pitch value (Lo) equal to a depth of the trench, the self-assembled block copolymer material comprising:
- a first polymer block having affinity for and swellable by absorption of an ink material selected from the group consisting of a mercaptoalcohol, an acetylenic having a hydrocarbon tail group, and an acetylenic having at least one of an alcohol functional group, a thiol functional group, an amine functional group, and a halide functional group;
- and
- a second polymer block having substantially no affinity for and not swellable by the ink material.
7 more elements
A method of forming a stamp, comprising:
- forming a trench in a material overlying a structure, the trench comprising opposing preferential wetting ends, and opposing parallel preferential wetting sidewalls separated from one another by a fixed width;
- filling the trench with a block copolymer material having an inherent pitch value (Lo) equal to a depth of the trench and comprising a first polymer block having chemical affinity for and swellable by an ink material and a second polymer block having substantially no affinity for and not swellable by the ink material;
- annealing the block copolymer material to form a self-assembled block copolymer material comprising an ordered array of polymer domains of the first polymer block in a matrix of the second polymer block;
- and
- exposing the self-assembled block copolymer material to the ink material and an organic solvent to absorb the ink material and the organic solvent into and substantially swell the ordered array of polymer domains of the first polymer block but not the matrix of the second polymer block.
2 more elements
A stamp, comprising:
- a material overlying a base structure;
- and
- a self-assembled block copolymer material extending through the material and having first horizontal boundaries extending in parallel in a first direction and second horizontal boundaries extending in parallel in a second direction perpendicular to the first direction, the self-assembled block copolymer material comprising:
- a first polymer block having affinity for and swellable by absorption of an ink material comprising one or more of a mercaptoalcohol, an acetylenic having a hydrocarbon tail group, and an acetylenic having at least one of an alcohol functional group, a thiol functional group, an amine functional group, and a halide functional group;
- and
- a second polymer block having substantially no affinity for and not swellable by the ink material.
3 more elements
Dependencies are inferred from the claim text.