Chamber for vibrational and environmental isolation of thin wafers

A measurement cavity comprising:

• a cylindrical chamber having a first open end and a second open end;
• a first cap removably provided on the cylindrical chamber to cover the first open end of the cylindrical chamber and a second cap removably provided on the cylindrical chamber to cover the second open end of the cylindrical chamber, wherein the first cap and the second cap hermetically seal an interior of the cylindrical chamber when covering the first open end and the second open end, respectively, and wherein the first cap is rigidly coupled to the second cap;
• and
• a wafer holder positioned within and coupled to the cylindrical chamber, the wafer holder having a first transmissibility |x/F| of an input force F at 60 Hz, wherein x is a displacement of the wafer evaluated in a vertical dimension defined between the first open end and the second open end;
• wherein the cylindrical chamber has a mass m, a stiffness k, and a damping constant c configured such that a second transmissibility |x/F| of the input force F at 60 Hz in the measurement cavity is a factor of at least 10 less than the first transmissibility |x/F|, and wherein the measurement cavity has a natural frequency of greater than 300 Hz.