Method of calibrating multiple chamber pressure sensors
AssigneeTokyo Electron Limited
InventorsRisako Matsuda, Keita Shouji
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AssigneeTokyo Electron Limited
InventorsRisako Matsuda, Keita Shouji
Estimating the term…
There is provided a method of calibrating multiple chamber pressure sensors of a substrate processing system. The substrate processing system includes: multiple chambers; multiple chamber pressure sensors; multiple gas suppliers configured to supply a gas to an internal space of the multiple chambers; multiple exhausters connected to the internal spaces of the multiple chambers via multiple exhaust flow paths; and multiple first gas flow paths. The method includes: acquiring a third volume, which is a sum of a first volume and a second volume; acquiring a first pressure change rate of the internal space of a selected chamber; calculating a second pressure change rate of the internal space of the selected chamber; and calibrating the selected chamber pressure sensor such that a difference between the first pressure change rate and the second pressure change rate is within a preset range.
A method of calibrating multiple chamber pressure sensors of a substrate processing system,
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