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US 11,549,807 B2Granted
Substrate and method for calibration of measurement apparatus
AssigneeKioxia Corporation
InventorsSusumu Iida, Satoshi Tanaka, Takayuki Uchiyama
Life of this patent
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Abstract
A pattern according to an embodiment includes first and second line patterns, each of the first and second line patterns extends in a direction intersecting a <111> direction and has a side surface, the side surface has at least one {111} crystal plane, the side surface of the first line pattern has a first roughness, and the side surface of the second line pattern has a second roughness larger than the first roughness.
Claims20
A substrate comprising
- first and second line patterns that extend in directions intersecting a <111> direction and have at least one {111} crystal plane on each of side surfaces,
- wherein the side surface of the first line pattern has a first roughness, and
- the side surface of the second line pattern has a second roughness larger than the first roughness.
A method for calibration of a measurement apparatus comprising:
- measuring first and second line patterns of a sample by the measurement apparatus;
- and
- calibrating the measurement apparatus based on a measurement result,
- the sample including
- the first and second line patterns that extend in directions intersecting a <111> direction and have at least one {111} crystal plane on each of side surfaces,
- wherein the side surface of the first line pattern has a first roughness, and
- the side surface of the second line pattern has a second roughness larger than the first roughness.
4 more elements
Dependencies are inferred from the claim text.