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US 11,549,084 B2Granted
Cleaning liquid composition and method for cleaning polymerization apparatus using same
AssigneeLG Chem, Ltd.
InventorsDae June Joe, Won Mun Choi, Eun Gyeong Lee
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Abstract
A cleaning liquid composition is provided. More particularly, a cleaning liquid composition includes a transition metal compound represented by Chemical Formula 1 (see the detailed description of the present invention); and a hydrocarbon-based solvent, and a cleaning method of a polymerization apparatus using the same.
Claims12
A cleaning liquid composition comprising:
- a transition metal compound represented by Chemical Formula 1 below;
- and
- a hydrocarbon-based solvent, wherein the hydrocarbon-based solvent is an aliphatic hydrocarbon solvent, an aromatic hydrocarbon solvent or a combination thereof:
- in Chemical Formula 1,
- M is ruthenium or osmium, R1 and R2 are each independently a hydrogen atom or a substituent represented by Chemical Formula 2 below, at least one of R1 or R2 is a substituent represented by Chemical Formula 2 below, X1 and X2 are each independently a halogen atom, and Ph is a phenyl group,
- in Chemical Formula 2,
- R3 and R4 are each independently a C1-C10 alkyl group;
- or R3 and R4 are linked with each other to form a saturated or unsaturated 5-membered ring,
- wherein the cleaning liquid composition comprises at least one first aromatic vinyl-based monomer and at least one or more vinyl-based monomers selected from the group consisting of a C2-C10 olefin monomer, a conjugated diene-based monomer, and a second aromatic vinyl-based monomer.
6 more elements
Dependencies are inferred from the claim text.