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US 11,548,804 B2Granted
Method and apparatus for processing oxygen-containing workpiece
AssigneeTokyo Electron Limited
InventorsReiko Sasahara, Yasuo Nakatani, Keiko Hada
Life of this patent
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Abstract
There is provided a method of processing an oxygen-containing workpiece. The method of processing an oxygen-containing workpiece includes controlling a fluorine concentration in the oxygen-containing workpiece based on at least one of a kind of a fluorine-containing processing gas, a processing temperature and a processing pressure used for processing the oxygen-containing workpiece.
Claims6
A method of processing an oxygen-containing workpiece, the method comprising:
- controlling a fluorine concentration in the oxygen-containing workpiece based on at least one of a kind of a fluorine-containing processing gas, a processing temperature and a processing pressure used for processing the oxygen-containing workpiece,
- wherein the controlling a fluorine concentration includes selecting whether the fluorine-containing processing gas in a non-plasma state is supplied to the oxygen-containing workpiece or the fluorine-containing processing gas is activated by a remote plasma and supplied to the oxygen-containing workpiece as a fluorine-containing processing radical, and
- wherein the controlling a fluorine concentration in the oxygen-containing workpiece is performed such that the fluorine concentration in the oxygen-containing workpiece becomes higher by increasing the processing temperature used for processing the oxygen-containing workpiece.
Dependencies are inferred from the claim text.