Apparatus for monitoring pulsed high-frequency power and substrate processing apparatus including the same
AssigneeSemes Co., Ltd.
InventorsJong Hwan An, Shin-Woo Nam, Hong Won Lee, Jae Bak Shim
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Abstract
Disclosed are an apparatus for monitoring pulsed high-frequency power and a substrate processing apparatus including the same. The apparatus includes an attenuation module configured to attenuate a pulsed high-frequency power signal; a rectifier module configured to convert the pulsed high-frequency power signal into a direct current signal; and a detection module configured to detect a pulse parameter based on the direct current signal.
Claims20
An apparatus for processing a substrate, the apparatus comprising:
- a chamber;
- a substrate support assembly within the chamber, the substrate support assembly including a lower electrode;
- a lower impedance matching unit connected to the lower electrode;
- a first RF power source connected to the lower impedance matching unit, the first RF power source configured to generate a first pulsed power signal according to a first ON/OFF pulse;
- a second RF power source connected to the lower impedance matching unit, the second RF power source configured to generate a second pulsed power signal according to a second ON/OFF pulse;
- a pulse input unit configured to apply the first ON/OFF pulse to the first RF power source and apply the second ON/OFF pulse to the second RF power source;
- and
- a monitoring unit including
- a rectifier module configured to convert the first pulsed power signal into a first direct current signal and convert the second pulsed power signal into a second direct current signal, and
- a detection module configured to detect a first pulse parameter including at least one of a pulse frequency of the first direct current signal, a pulse duty ratio of the first direct current signal, and a pulse phase difference of the first direct current signal and the second direct current signal.
An apparatus for processing a substrate, the apparatus comprising:
- a chamber including an upper electrode and a lower electrode;
- a pulse input unit configured to generate a plurality of ON/OFF pulses;
- a plurality of RF power sources configured to generate a plurality of pulsed power signals according to the plurality of ON/OFF pulses for applying the plurality of pulsed power signals to at least one of the upper electrode and the lower electrode;
- and
- a monitoring unit including
- a rectifier module configured to convert the plurality of pulsed power signals into a plurality of direct current signals, and
- a detection module configured to detect a pulse parameter including at least one of a pulse frequency of one of the plurality of direct current signals, a pulse duty ratio of the one of the plurality of direct current signals, and a pulse phase difference between the plurality of direct current signals.
An apparatus for monitoring a plurality of pulsed power signals, the apparatus comprising:
- a rectifier module configured to convert the plurality of pulsed power signals into a plurality of direct current signals;
- and
- a detection module configured to detect a pulse parameter including at least one of a pulse frequency of one of the plurality of direct current signals, a pulse duty ratio of the one of the plurality of direct current signals, and a pulse phase difference between the plurality of direct current signals.
Dependencies are inferred from the claim text.