Chemical complementary metal-oxide semiconductor (CCMOS) colorimetric sensors for multiplex detection and analysis

A method of fabricating a colorimetric sensor array, the method comprising:

• spraying a sensing fluid in the form of droplets directly on a surface of a CMOS image sensor, each droplet covering one or more pixels of the CMOS image sensor with the sensing fluid, wherein the sensing fluid comprises a solvent and a sensing material and the droplets are distributed randomly on the surface of the CMOS image sensor;
• and
• removing the solvent from the droplets on the surface of the CMOS image sensor, thereby yielding a multiplicity of sensing elements on the surface of the CMOS image sensor.

A colorimetric sensor array comprising:

• a CMOS image sensor having a surface comprising pixels;
• and
• a multiplicity of colorimetric sensing elements, each sensing element comprising a sensing material disposed directly on one or more of the pixels, wherein the colorimetric sensing elements of the multiplicity of colorimetric sensing elements are distributed randomly on the surface of the CMOS image sensor, and wherein each sensing element further comprises porous nanoparticles.