Back to results
US 11,542,935 B2Granted
Gas recirculation device and system having such a device
AssigneePfeiffer Vacuum GmbH
InventorsSebastian Oberbeck, Jonas Becker
Life of this patent
Estimating the term…
Abstract
The invention relates to a recirculation device for a gas of a process device, said recirculation device comprising a recirculation pump, wherein the recirculation pump is a side channel pump.
Claims15
A recirculation device for a gas of a process device, said recirculation device comprising:
- a recirculation pump, wherein the recirculation pump is a side channel pump which includes a rotor having a plurality of rotor blades;
- wherein an intermediate space between two rotor blades adjacent in a direction of movement has a pointed roof-shaped structure defining a ridge edge, wherein each ridge edge extends from a respective blade tip to a base of an adjacent blade, such that the adjacent rotor blades are not connected with each other via the roof-shaped structure.
A system comprising
- a process device having a space and/or a line for receiving a gas;
- and
- a recirculation device by which the gas can be removed from the process device and can be returned into the process device, said recirculation device comprising a recirculation pump, wherein the recirculation pump is a side channel pump which includes a rotor having a plurality of rotor blades;
- wherein an intermediate space between two rotor blades adjacent in a direction of movement has a pointed roof-shaped structure defining a ridge edge, wherein each ridge edge extends from a respective blade tip to a base of an adjacent blade, such that the adjacent rotor blades are not connected with each other via the roof-shaped structure.
1 more element
Dependencies are inferred from the claim text.