Substrate processing apparatus and substrate processing method
AssigneeTokyo Electron Limited
InventorYoshitaka Miura
Life of this patent
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Abstract
A substrate processing apparatus includes: a processing container; an injector provided inside the processing container and having a shape extending in a longitudinal direction along which a processing gas is supplied; a holder fixed to the injector; a first magnet fixed to the holder and disposed inside the processing container; a second magnet separated from the first magnet by a partition plate and disposed outside the processing container; and a driving part configured to rotate the second magnet, wherein the first magnet and the second magnet are magnetically coupled to each other, and wherein by rotating the second magnet by the driving part, the first magnet magnetically coupled to the second magnet is rotated, and the injector rotates about the longitudinal direction as an axis.
Claims6
A substrate processing apparatus comprising:
- a processing container;
- an injector provided inside the processing container and having a shape extending in a longitudinal direction along which a processing gas is supplied;
- a holder disposed inside the processing container and fixed to the injector;
- a first magnet fixed to the holder and disposed inside the processing container;
- a partition plate separating an inside and an outside of the processing container from each other;
- a second magnet separated from the first magnet by the partition plate and disposed outside the processing container;
- and
- a driving part configured to rotate the second magnet,
- wherein the first magnet and the second magnet are magnetically coupled to each other, and
- wherein by rotating the second magnet by the driving part, the first magnet magnetically coupled to the second magnet is rotated, and the injector rotates about the longitudinal direction as an axis.
A substrate processing method using a substrate processing apparatus including:
- a processing container;
- an injector provided inside the processing container and having a shape extending in a longitudinal direction along which a processing gas is supplied;
- a holder disposed inside the processing container and fixed to the injector;
- a first magnet fixed to the holder and disposed inside the processing container;
- a partition plate separating an inside and an outside of the processing container from each other;
- a second magnet separated from the first magnet by the partition plate and disposed outside the processing container;
- and a driving part configured to rotate the second magnet, the first magnet and the second magnet being magnetically coupled to each other, and in a state in which the processing gas is supplied into the processing container from the injector, the method comprising:
- rotating the second magnet by the driving part such that the injector rotates in a first direction;
- and
- rotating the second magnet by the driving part such that the injector rotates in a second direction opposite the first direction.
Dependencies are inferred from the claim text.