Apparatus for removing boron
AssigneeIndustrial Technology Research Institute
InventorsTa-Ching Hsiao, Chu-Pi Jeng, Kuo-Lun Huang, Mu-Hsi Sung, Keng-Yang Chen, Li-Duan Tsai
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Abstract
A method for removing boron is provided, which includes (a) mixing a carbon source material and a silicon source material in a chamber to form a solid state mixture, (b) heating the solid state mixture to a temperature of 1000° C. to 1600° C., and adjusting the pressure of the chamber to 1 torr to 100 torr. The method also includes (c) conducting a gas mixture of a first carrier gas and water vapor into the chamber to remove boron from the solid state mixture, and (d) conducting a second carrier gas into the chamber.
Claims7
An apparatus for removing boron, comprising:
- a chamber for containing a solid state mixture of a carbon source material and a silicon carbon source;
- a carrier gas source for transferring a first carrier gas to the chamber;
- and
- a humidifier connected to the chamber for transferring a gas mixture of a second carrier gas and water vapor to the chamber,
- wherein the humidifier comprises:
- a body for containing water;
- a first heating element at a bottom of the body for heating the water to form the water vapor;
- an inlet pipe for conducting the second carrier gas into the water to form the gas mixture of the second carrier gas and the water vapor;
- an outlet pipe for transferring the gas mixture of the second carrier gas and the water vapor into the chamber;
- and
- a liquid level meter connected to the body and disposed at a side of the body for detecting water level in the body.
The apparatus as claimed in 1, wherein the chamber is heated to a temperature of 1000° C. to 1600° C. under a pressure of 1 torr to 100 torr during the step of removing boron.
Dependencies are inferred from the claim text.