Systems and methods for exposure control
AssigneeZhejiang Dahua Technology Co., Ltd.
InventorsErping Qu, Qianfeng Huang, Runfa Pan, Liangcheng Li
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AssigneeZhejiang Dahua Technology Co., Ltd.
InventorsErping Qu, Qianfeng Huang, Runfa Pan, Liangcheng Li
Estimating the term…
The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.
A system, comprising:
A method implemented on a computing device having at least one processor and at least one storage device, the method comprising:
A non-transitory computer readable medium, comprising a set of instructions, wherein when executed by at least one processor, the set of instructions direct the at least one processor to effectuate a method, the method comprising:
Dependencies are inferred from the claim text.