Evaporating mask plate, evaporating mask plate set, evaporating system, and alignment test method

An evaporating mask plate, comprising a mask pattern plate;

• wherein
• the mask pattern plate comprises an evaporating area and a test area located around the evaporating area;
• the test area is provided with at least two test element groups located in different regions of the test area, and each test element group comprises at least one test hole for alignment,
• the evaporating mask plate further comprises a frame and a shielding strip;
• wherein the shielding strip is arranged in the frame, the mask pattern plate is arranged above the shielding strip and the frame, and the shielding strip makes the test hole in only one test element group of the mask pattern plate be in a penetrating state.

An alignment test method for performing an alignment test on a plurality of film layers with the same evaporating pattern in the same device by using an evaporating mask plate set,

• wherein the evaporating mask plate set comprises:
• a plurality of evaporating mask plates, the number of the plurality of evaporating mask plates is the same as the number of the plurality of film layers with the same evaporating pattern;
• each evaporating mask plate comprises a mask pattern plate;
• the mask pattern plate comprises an evaporating area and a test area located around the evaporating area;
• the test area is provided with the test element groups, the number of the test element groups is the same as the number of the plurality of film layers with the same evaporating pattern, the test element groups are located in different regions of the test area, and each test element group comprises at least one test hole for alignment, the mask pattern plate further comprises a grasping area, a partially-etched area and a fully-etched area, wherein the partially-etched area does not go through the mask pattern plate;
• the fully-etched area goes through the mask pattern plate;
• with respect to the partially-etched area, the fully-etched area is close to a central region of the mask pattern plate;
• the alignment test method comprises:
• when the alignment test is performed on the Nth film layer by using the Nth evaporating mask plate corresponding to the Nth film layer in the plurality of film layers among the evaporating mask plates, shielding test holes in the test element group of the Nth evaporating mask plate other than the test hole in the test element group corresponding to the Nth film layer, wherein N is greater than or equal to 1, and is less than or equal to the number of the plurality of film layers;
• and
• performing the alignment test on the Nth film layer by using the test hole in the test element group corresponding to the Nth film layer in the Nth evaporating mask plate.