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US 11,538,764 B2Granted
Flexible and stretchable interconnects for flexible systems
AssigneeThe Regents of the University of California
InventorsSubramanian S. Iyer, Arsalan Alam, Amir Hanna, Takafumi Fukushima
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Abstract
A flexible device includes: (1) a flexible substrate; and (2) an interconnect disposed over the flexible substrate, wherein the interconnect has a varying vertical displacement along its length, relative to a top surface of the flexible substrate.
Claims16
A flexible device comprising:
- a flexible substrate;
- and an interconnect disposed over the flexible substrate, wherein the interconnect comprises a plurality of corrugations that respectively define a varying vertical displacement of the interconnect along its length, relative to a top surface of the flexible substrate, wherein the interconnect includes multiple interconnected corrugated segments;
- wherein the corrugated segments include a first segment extending along a first direction parallel to the top surface of the flexible substrate, a second segment extending along a second direction non-parallel to the top surface of the flexible substrate and the second direction forms a non-zero angle with the first direction, and a third segment extending along a third direction parallel or non-parallel to the top surface of the flexible substrate and the third direction forms a non-zero angle with the second direction.
A flexible device comprising:
- a flexible substrate;
- a device component embedded in the flexible substrate while an active surface of the device component is exposed from the flexible substrate, wherein the device component includes a bonding pad adjacent to the active surface;
- a stress buffer layer disposed over the flexible substrate and the device component, wherein the stress buffer layer defines an opening exposing the bonding pad of the device component;
- and an interconnect disposed over the stress buffer layer and electrically connected to the bonding pad of the device component through the opening of the stress buffer layer, wherein the interconnect comprises a plurality of corrugations that respectively define a varying vertical displacement of the interconnect along its length, relative to a top surface of the stress buffer layer, wherein the stress buffer layer has multiple trenches extending into the stress buffer layer relative to the top surface of the stress buffer layer, and the interconnect extends over the top surface of the stress buffer layer and into the trenches of the stress buffer layer.
1 more element
A process of forming a flexible device, comprising:
- providing a flexible substrate having a surface region;
- and forming an interconnect over the surface region of the flexible substrate, wherein the interconnect is formed to comprise a plurality of corrugations that respectively define a varying vertical displacement of the interconnect with respect to the surface region, wherein providing the flexible substrate includes forming the flexible substrate having multiple depressions in the surface region, and the interconnect includes multiple interconnected concave segments extending into corresponding ones of the depressions.
A process of forming a flexible device, comprising:
- providing a flexible substrate and a device component embedded in the flexible substrate while an active surface of the device component is exposed from the flexible substrate, wherein the device component includes a bonding pad adjacent to the active surface;
- forming a stress buffer layer over the flexible substrate and the device component, wherein forming the stress buffer layer includes forming an opening in the stress buffer layer exposing the bonding pad of the device component, and further includes forming the stress buffer layer having a surface region;
- and forming an interconnect over the surface region of the stress buffer layer and electrically connected to the bonding pad of the device component through the opening of the stress buffer layer, wherein the interconnect is formed to comprise a plurality of corrugations that respectively define a varying vertical displacement of the interconnect with respect to the surface region, wherein forming the stress buffer layer includes forming the stress buffer layer having multiple trenches in the surface region, and the interconnect extends over a top surface of the stress buffer layer and into the trenches of the stress buffer layer.
Dependencies are inferred from the claim text.