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US 11,538,714 B2Granted
System apparatus and method for enhancing electrical clamping of substrates using photo-illumination
AssigneeApplied Materials, Inc.
InventorsQin Chen, Julian G. Blake, Michael W. Osborne, Steven M. Anella, Jonathan D. Fischer
Life of this patent
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Abstract
An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy, equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to the back side of the substrate.
Claims9
An apparatus, comprising:
- a clamp to clamp a substrate wherein the substrate has a front side and a back side opposing the front side and the clamp is arranged opposing the back side of the substrate;
- an illumination system, disposed to direct radiation to the back side of the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy, the radiation energy being equal to or above a threshold energy to generate mobile charge in the substrate,
- wherein the clamp is an electrostatic clamp that comprises a plurality of openings that face the substrate to transmit the radiation directly to the substrate, and wherein the illumination system comprises a plurality of radiation sources distributed across a substrate stage, disposed to direct the radiation through the plurality of openings of the electrostatic clamp;
- and
- wherein the electrostatic clamp defines a gap between the electrostatic clamp and the substrate stage, wherein the gap defines a hollow light guide for the radiation.
2 more elements
A substrate processing system, comprising:
- a process chamber;
- an electrostatic clamp, disposed in the process chamber, the electrostatic clamp to clamp a substrate wherein the substrate has a front side and a back side opposing the front side and the electrostatic clamp is arranged opposing the back side of the substrate;
- and
- an illumination system, disposed to direct radiation to the back side of the substrate, when the substrate is disposed on the electrostatic clamp, wherein the radiation comprises a radiation energy, the radiation energy being equal to or above 2.5 eV,
- wherein the electrostatic clamp comprises a plurality of openings that face the substrate to transmit the radiation directly to the substrate and wherein the illumination system comprises a plurality of radiation sources distributed across a substrate stage, disposed to direct the radiation through the plurality of openings of the electrostatic clamp;
- and
- wherein the electrostatic clamp defines a gap between the electrostatic clamp and the substrate stage, wherein the gap defines a hollow light guide for the radiation.
4 more elements
Dependencies are inferred from the claim text.