System and method for aligning a mask with a substrate

An integrated platform for processing a substrate, the integrated platform comprising:

• a transfer chamber comprising a substrate transfer robot;
• a factory interface comprising:
• a substrate carrier chamber configured to receive a substrate and chuck the substrate to a carrier;
• and a factory interface transfer robot configured to transfer the substrate and the carrier from the factory interface to the transfer chamber;
• a plurality of processing chambers and an alignment module coupled to the transfer chamber, wherein the alignment module comprises:
• a mask stocker configured house a mask cassette storing a plurality of masks, and comprising a first valve assembly;
• and an alignment chamber directly coupled to the mask stocker and comprising:
• an alignment stage disposed within an interior volume of the alignment chamber, and configured to support the carrier and the substrate;
• a transfer robot disposed within an interior volume of the alignment chamber, and configured to transfer a mask of the plurality of masks from the mask stocker to the alignment stage via the first valve assembly, and position the mask over the substrate;
• and a second valve assembly configured to isolate the interior volume of the alignment chamber from the transfer chamber, wherein the carrier and substrate are loaded into the alignment chamber via the second valve assembly, and wherein the first valve assembly is configured to isolate an interior volume of the mask stocker from the interior volume of the alignment chamber.