Sample holder and charged particle beam device
AssigneeHitachi High-Tech Science Corporation
InventorToshiyuki Iwahori
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AssigneeHitachi High-Tech Science Corporation
InventorToshiyuki Iwahori
Estimating the term…
A sample holder (19) includes a base portion (41), a sample carrying portion (42), a rotation guide portion (43), a cooling stage (46), a connection member (47), a first support portion, and a fixing guide portion (48). The base portion (41) is configured to be fixed to a stage (12), which is configured to be driven to rotate by a stage driving mechanism (13). The rotation guide portion (43) is configured to guide synchronous rotation of the base portion (41) and the sample carrying portion (42). The cooling stage (46) is configured to cool a sample (S). The connection member (47) is configured to be connected to the cooling stage (46). The first support portion is configured to support the base portion (41), which is configured to be driven to rotate by the stage (12).
A sample holder, comprising:
Dependencies are inferred from the claim text.
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From the US filing history. Foreign family members aren’t listed.
Details: means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging: cooling arrangements
Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated: maintaining constant desired temperature
Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated: holding mechanisms
About 14 years 9 months of term left · ends 6 Aug 2041 (estimated)
This application claims the benefit of Japanese Patent Application No. 2019-173703, filed Sep. 25, 2019, which is hereby incorporated by reference in their entirety into this application.
The present invention relates to a sample holder and a charged particle beam device.
Hitherto, there has been a demand for charged particle beam devices such as electron beam devices, focused ion-beam devices, or complex beam devices using a focused ion beam and an electron beam to perform so-called in-situ sample analyses of various types. For example, there have been known charged particle beam devices including, for example, a cooling stage for processing and observing a sample while cooling the sample, a multi-probe for analyzing electrical characteristics of a sample, and a nano-intender for analyzing mechanical characteristics of a sample.
FIG. 1 is a perspective view for illustrating a configuration of a charged particle beam device according to an embodiment of the present invention.
FIG. 2 is a partial cutaway view for illustrating a sample chamber and a replacement chamber of the charged particle beam device according to the embodiment of the present invention, as seen from the Z-axis direction.
FIG. 3 is a perspective view for illustrating respective configurations of a stage and a sample holder of the charged particle beam device according to the embodiment of the present invention.
Referring to the accompanying drawings, a sample holder and a charged particle beam device according to an embodiment of the present invention is described below.
(Charged Particle Beam Device)
FIG. 1 is a perspective view for illustrating a configuration of a charged particle beam device 10 according to an embodiment of the present invention. FIG. 2 is a partial cutaway view for illustrating a sample chamber 11 and a replacement chamber 18 of the charged particle beam device 10 according to the embodiment, as seen from the Z-axis direction. In the following, the X-axis, the Y-axis, and the Z-axis form a three-dimensional orthogonal coordinate system. Axial directions of the X-axis, Y-axis, and the Z-axis orthogonal to one another in a three-dimensional space are directions parallel to the corresponding axes. The X-axis direction and the Y-axis direction are parallel to a reference plane orthogonal to an up-and-down direction of the charged particle beam device 10 (for example, a horizontal plane). The Z-axis direction is parallel to the up-and-down direction of the charged particle beam device 10 (for example, a vertical direction orthogonal to the horizontal plane).