Machine learning for quantum material synthesis
AssigneeRaytheon BBN Technologies Corp.
InventorsKin Chung Fong, Man-Hung Siu, Zhuolin Jiang
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Abstract
A method for classifying images of oligolayer exfoliation attempts. In some embodiments, the method includes forming a micrograph of a surface, and classifying the micrograph into one of a plurality of categories. The categories may include a first category, consisting of micrographs including at least one oligolayer flake, and a second category, consisting of micrographs including no oligolayer flakes, the classifying comprising classifying the micrograph with a neural network.
Claims20
A method for classifying images, the method comprising:
- forming a micrograph of a surface;
- and
- classifying the micrograph into one of a plurality of categories, the categories including:
- a first category, consisting of micrographs including at least one oligolayer flake, and
- a second category, consisting of micrographs including no oligolayer flakes,
- the classifying comprising classifying the micrograph with a neural network.
A method for classifying exfoliation methods, the method comprising:
- performing an exfoliation attempt using a candidate exfoliation method, the performing of the exfoliation attempt resulting in products of the exfoliation attempt on a surface of a substrate;
- forming a micrograph of the surface of the substrate;
- and
- classifying the micrograph into one of a plurality of categories, the categories including:
- a first category, consisting of micrographs including at least one oligolayer flake, and
- a second category, consisting of micrographs including no oligolayer flakes,
- the classifying comprising classifying the micrograph with a neural network.
A system for classifying attempts to form oligolayer flakes, the system comprising:
- a processing circuit,
- the processing circuit being configured to run a neural network to classify each of a plurality of micrographs of a surface of a substrate into one of a plurality of categories, the categories including:
- a first category, consisting of micrographs including at least one oligolayer flake, and
- a second category, consisting of micrographs including no oligolayer flakes.
Dependencies are inferred from the claim text.