Measurement apparatus, lithography apparatus, and method of manufacturing article

A measurement apparatus that measures a position of an object that includes a first mark and a second mark, the first mark being used for measuring a position of the object in a first direction and the second mark being used for measuring a position of the object in a second direction different from the first direction, the measurement apparatus comprising:

• an image capturing unit configured to capture the first mark and the second mark in a state where the first mark and the second mark are contained in a field of view;
• and
• a polarizing element configured to generate:
• a plurality of first polarized light beams that illuminate the first mark by being incident on the first mark, the plurality of first polarized light beams being different from each other in incident angles on the first mark, and a polarization direction of each of the plurality of first polarized light beams, in a state of being incident on the first mark, is a first polarization direction parallel to the first direction;
• and
• a plurality of second polarized light beams that illuminate the second mark by being incident on the second mark, the plurality of second polarized light beams being different from each other in incident angles on the second mark, and a polarization direction of each of the plurality of second polarized beams, in a state of being incident on the second mark, is a second polarization direction parallel to the second direction,
• wherein the plurality of first polarized light beams obliquely illuminate the first mark, and light from the first mark illuminated with the plurality of first polarized light beams is incident on the image capturing unit, and
• wherein the plurality of second polarized light beams obliquely illuminate the second mark, and light from the second mark illuminated with the plurality of second polarized light beams is incident on the image capturing unit.