Organotin oxide hydroxide patterning compositions, precursors, and patterning

A system comprising:

• a deposition chamber having an interior isolated from the ambient atmosphere;
• a substrate within the interior of the deposition chamber configured to receive a deposition on a surface of the substrate, wherein the substrate is maintained at a temperature of less than 200° C.;
• an inlet into the deposition chamber;
• structure configured to deliver flow from a supply of an inert gas;
• a supply of an organotin composition comprising a compound described by the formula RSnX3, where R is an organic ligand with 1-31 carbon atoms and is bound to Sn with a metal-carbon bond and wherein X is selected from the group consisting of alkylamido or dialkylamido (—NR1R2, where R1 and R2 are independently hydrocarbon groups with 1-10 carbon atoms or hydrogen), siloxo (—OSiR1R2R3, where R1, R2′ are independently hydrocarbon groups with 1-10 carbon atoms), silylamido (—N(SiR13)(R2), where R1 and R2 are independently hydrocarbon groups with 1-10 carbon atoms), disilylamido (—N(SiR13)(SiR23) where R1 and R2 are independently hydrocarbon groups with 1-10 carbon atoms), alkoxo and aryloxo (—OR, where R is an alkyl or aryl group with 1-10 carbon atoms), azido (—N3), alkynido (—C≡CR, where R is a hydrocarbon group with 1-9 carbon atoms), amidato (—NR1(COR2) where R1 and R2 are independently hydrocarbon groups with 1-7 carbon atoms or hydrogen), amidinato (—NR1C(NR2)R3) where R1 and R2 are independently hydrocarbon groups with 1-8 carbon atoms or hydrogen), imido (—N(COR1)(COR2), where R1 and R2 are independently hydrocarbon groups with 1-8 carbon atoms or hydrogen), or fluorinated analogues thereof, or combinations thereof;
• structure configured to deliver flow of a first precursor vapor from the supply of the organotin compound with the inert gas as a carrier gas to the inlet to provide for formation of an organotin layer on the substrate surface within the deposition chamber;
• and
• structure to deliver a second precursor vapor comprising water, hydrogen peroxide or a combination thereof capable of reacting with the composition in the first precursor vapor under conditions in the deposition chamber to form a composition with non-volatile components and a volatile component comprising hydrolysis reaction product with X, wherein the substrate is configured with a surface to receive the non-volatile components of the composition.