Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsNicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov
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Abstract
Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
Claims20
A movable table apparatus for a lithographic tool, comprising a projection system configured to project a beam of radiation onto a surface and a liquid supply system configured to provide a liquid to a space between an object, when on the table apparatus, and the projection system, the movable table apparatus comprising:
- a structure arranged to have a first surface to be essentially co-planar with a top surface of the object when on the table;
- a second surface having a plurality of burls arranged to support the object;
- and
- a drain in the substrate table configured to receive liquid which leaks, in use, through a gap between an edge of the object and the structure into the drain, the drain comprising a channel defined at least in part by at least part of the second surface and the structure, the at least part of the second surface and the channel extending underneath, and covered at least in part by, at least a portion of the structure.
A movable table apparatus for a lithographic tool, comprising a projection system configured to project a beam of radiation onto a surface and a liquid supply system configured to provide a liquid to a space between an object, when on the table apparatus, and the projection system, the movable table apparatus comprising:
- a structure arranged to have a first surface to be essentially co-planar with a top surface of the object when on the table;
- a second surface having a plurality of burls arranged to support the object;
- and
- an aperture defined at least in part by the second surface, the aperture located underneath, and covered by, the structure, the aperture configured to receive liquid which leaks through a gap between an edge of the object and the structure.
A movable table apparatus for a lithographic tool, comprising a projection system configured to project a beam of radiation onto a surface and a liquid supply system configured to provide a liquid to a space between an object, when on the table apparatus, and the projection system, the movable table apparatus comprising:
- a structure arranged to have a first surface to be essentially co-planar with a top surface of the object when on the table;
- a second surface having a plurality of burls arranged to support the object;
- and
- an opening at least partially defined using by or in the second surface, the opening configured to receive liquid which leaks, in use, through a gap between an edge of the object and the structure, and the opening located under, and covered at least in part by, at least a portion of the structure.
Dependencies are inferred from the claim text.