Method of manufacturing array substrate, and array substrate

A method of manufacturing an array substrate, comprising:

• forming a first metal layer and an insulating layer in sequence on a base substrate, the insulating layer covering the first metal layer;
• forming an etching barrier layer on the insulating layer, wherein the etching barrier layer is in contact with the insulating layer;
• etching the etching barrier layer and the insulating layer multiple times, wherein an effective blocking area of the etching barrier layer decreases successively in each etching to form a connection hole penetrating the insulating layer, the connection hole includes a plurality of via holes connected in sequence, and a slope angle of a hole wall of each via hole is smaller than a preset slope angle;
• and
• forming a second metal layer, the second metal layer being connected to the first metal layer through the connection hole, wherein
• a material of the etching barrier layer is chromium or organosiloxane;
• and
• an etching gas is used in the etching the etching barrier layer and the insulating layer multiple times, wherein an etching selection ratio of the etching gas to the insulating layer and the etching barrier layer is greater than 10:1.