Method of manufacturing semiconductor device, method of managing parts, and recording medium

A method of manufacturing a semiconductor device, comprising:

• executing a process recipe for processing a substrate by supplying a process gas into a process furnace;
• and
• checking a characteristic value of a supply valve installed at a process gas supply line for supplying the process gas into the process furnace,
• wherein the checking of the characteristic value of the supply valve comprises:
• supplying an inert gas into the process gas supply line for a certain period of time in a state where an adjusting valve that is installed at an exhaust portion of the process furnace and adjusts an internal pressure of the process furnace is opened;
• detecting a pressure value in a supply pipe provided with the supply valve while supplying the inert gas into the process gas supply line in the state where the adjusting valve is opened;
• and
• calculating the characteristic value of the supply valve based on the detected pressure value, and
• wherein the checking of the characteristic value of the supply valve is executed after the supply valve has been replaced with a new supply valve.

A method of manufacturing a semiconductor device, comprising:

• executing a process recipe for processing a substrate by supplying a process gas into a process furnace;
• and
• checking a characteristic value of a supply valve installed at a process gas supply line for supplying the process gas into the process furnace,
• wherein the checking of the characteristic value of the supply valve comprises:
• supplying an inert gas into the process gas supply line for a certain period of time in a state where an adjusting valve that is installed at an exhaust portion of the process furnace and adjusts an internal pressure of the process furnace is opened;
• detecting a pressure value in a supply pipe provided with the supply valve while supplying the inert gas into the process gas supply line in the state where the adjusting valve is opened;
• and
• calculating the characteristic value of the supply valve based on the detected pressure value, and
• wherein the checking of the characteristic value of the supply valve includes heating the inert gas by a heater provided at the supply valve.

A method of managing parts, comprising:

• supplying an inert gas into a process gas supply line for a certain period of time in a state where an adjusting valve that is installed at an exhaust portion of a process furnace and adjusts an internal pressure of the process furnace is opened, the process gas supply line being provided with a supply valve for supplying a process gas into the process furnace;
• detecting a pressure value in a supply pipe provided with the supply valve while supplying the inert gas into the process gas supply line in the state where the adjusting valve is opened;
• and
• calculating a characteristic value of the supply valve based on the detected pressure value,
• wherein the method is executed after maintenance operation of a heater that heats the supply valve has been performed.

A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform a process that executes a correction recipe for checking a characteristic value of a supply valve for supplying a process gas into a process furnace, the process that executes the correction recipe, comprising:

• supplying an inert gas into a process gas supply line for a certain period of time in a state where an adjusting valve that is installed at an exhaust portion of the process furnace and adjusts an internal pressure of the process furnace is fully opened, the process gas supply line being provided with the supply valve;
• detecting a pressure value in a supply pipe provided with the supply valve while supplying the inert gas into the process gas supply line in the state where the adjusting valve is fully opened;
• and
• calculating the characteristic value of the supply valve based on the detected pressure value.