Modifiable magnet configuration for arc vaporization sources

A method for coating substrates in an ARC vaporization installation, the method comprising:

• providing an ARC vaporization source with a magnetic field arrangement, the magnetic field arrangement including marginal permanent magnets, a central permanent magnet, and at least one ring coil placed behind a target comprising coating material;
• the magnetic field arrangement generating magnetic fields on and above a surface of the target;
• adjusting a position of the central permanent magnet and the marginal permanent magnets in at least three settings, the at least three settings comprising:
• (a) a first setting at which the central permanent magnet and the marginal permanent magnets take up a first position in which poles of the central permanent magnet and the marginal permanent magnets are closest to the coating material, wherein ends of poles of the marginal permanent magnets that are closest to the coating material, and an end of a pole of the central permanent magnet that is closest to the coating material, and an end of the at least one ring coil that is closest to the coating material, lie in one plane;
• (b) a second setting at which the central permanent magnet and the marginal permanent magnets take up a second position at a distance between 5 mm and 50 mm further from the surface of the target than the first position, wherein in the second position a first distance between the ends of the poles of the marginal permanent magnets which are closest to the coating material and the end of the pole of the central permanent magnet which is closest to the coating material and the surface of the target is greater than a second distance between the end of the at least one ring coil which is closest to the coating material and the surface of the target;
• and
• (c) a third setting at which the central permanent magnet and the marginal permanent magnets are at a third position at a distance greater than 50 mm further from the surface of the target than the first position;
• adjusting a strength of a generated magnetic field based on the position of the central permanent magnet and the marginal permanent magnets among the at least three settings;
• and
• coating the substrates by an ARC vaporization coating process performed by the ARC vaporization source at each of the at least three settings.