Chemical vapor deposition process for depositing a coating and the coating formed thereby

A chemical vapor deposition process for depositing a coating, comprising:

• providing a glass substrate;
• forming a gaseous mixture comprising a silicon-containing compound, an oxygen-containing compound, a radical scavenger, and a titanium-containing compound;
• feeding the gaseous mixture through a coating apparatus prior to forming the coating;
• and
• discharging the gaseous mixture from the coating apparatus, directing the gaseous mixture toward and along the glass substrate, and reacting the mixture over the glass substrate to form the coating thereover, the coating having a refractive index of 1.48 or more;
• wherein the gaseous mixture comprises 0.1 to 5% of the titanium-containing compound by volume.