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US 11,535,550 B2Granted
Yttrium aluminum silicate glass ceramic coating for semiconductor chamber apparatus
AssigneeMorgan Advanced Ceramics, Inc.
InventorChengtsin Lee
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Abstract
Articles may be protected against halide plasma, by applying a rare earth-containing glaze to the surface of the article. The glaze may be a coating comprising; 20 to 90 mol % SiO2, 0 to 60 mol % Al2O3, 10 to 80 mol % rare earth oxides and/or rare earth fluorides (REX), wherein SiO2+Al2O3+REX≥60 mol %.
Claims15
A coated article comprising:
- a substrate and a coating comprising:
- 20 to 90 mol % SiO2;
- 0 to 60 mol % Al2O3;
- and 10 to 80 mol % total rare earth oxides and rare earth fluorides (REX);
- wherein SiO2+Al2O3+REX≥60 mol % of a total amount of the coating, and wherein the rare earth fluorides are present in an amount of at least 5 mol % of the total amount of the coating.
2 more elements
A glaze precursor mixture comprising a carrier, and a composition to produce a coating comprising:
- 20 to 90 mol % SiO2;
- 0 to 60 mol % Al2O3;
- and 10 to 80 mol % total rare earth oxides and rare earth fluorides (REX);
- wherein SiO2+Al2O3+REX≥60 mol % of a total amount of the coating, and wherein the rare earth fluorides are present in an amount of at least 5 mol % in the total amount of the coating.
1 more element
Dependencies are inferred from the claim text.