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US 11,534,805 B2Granted
Cleaning method and processing apparatus
AssigneeTokyo Electron Limited
InventorsMasami Oikawa, Tomoya Hasegawa, Koji Sasaki
Life of this patent
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Abstract
A cleaning method for removing a film deposited in a processing container includes: executing a cleaning of a processing container by supplying a cleaning gas to the processing container while increasing a pressure in the processing container in a stepwise manner at a plurality of time points, thereby removing a film deposited in the processing container; and detecting an end point of the cleaning based on time-dependent data of a concentration of a predetermined gas generated during the execution of the cleaning, for each pressure of the plurality of time points.
Claims12
A cleaning method comprising:
- executing a cleaning of a processing container by supplying a cleaning gas to the processing container while increasing a pressure in the processing container in a stepwise manner at a plurality of time points, thereby removing a film deposited in the processing container;
- and
- detecting an end point of the cleaning based on time-dependent data of a concentration of a predetermined gas generated during the execution of the cleaning, for each pressure of the plurality of time points.
Dependencies are inferred from the claim text.