Systems and methods to clean a continuous substrate
AssigneeIllinois Tool Works Inc.
InventorGregory T. Hall
Life of this patent
Estimating the term…
Abstract
An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; transporting the continuous substrate from a first volume having the high pressure, low volume spray, to a second volume having an agitation bath; vacuuming moisture from the continuous substrate during transporting of the continuous substrate from the first volume to the second volume; directing energy at the continuous substrate in the agitation bath using at least one of a megasonic transducer or an ultrasonic transducer; and drying the continuous substrate.
Claims18
A method to clean a continuous substrate, the method comprising:
- applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate;
- transporting the continuous substrate from a first volume having the high pressure, low volume spray, to a second volume having an agitation bath;
- vacuuming moisture from the continuous substrate during transporting of the continuous substrate from the first volume to the second volume;
- directing energy at the continuous substrate in the agitation bath using at least one of a megasonic transducer or an ultrasonic transducer;
- and
- drying the continuous substrate.
Dependencies are inferred from the claim text.