System and method for optimizing a lithography exposure process
AssigneeOnto Innovation Inc.
InventorsElvino da Silveira, Keith F. Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
Life of this patent
Estimating the term…
Abstract
A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.
Claims15
A method to fabricate semiconductor devices, the method comprising:
- receiving a recipe;
- based on a path defined in the recipe, exposing a first group of devices having a first alignment on a substrate using a first shot size, wherein the substrate is positioned on a stage;
- based on the recipe, moving the stage to align a second group of devices having a second alignment on the substrate;
- and
- based on the path, exposing the second group of devices on the substrate using a second shot size.
A lithography system for fabricating semiconductor devices, comprising:
- a stage to support a substrate;
- and
- a projection camera to fabricate expose a first group of devices having a first alignment on the substrate at a first time period based on a path defined in a recipe using a first shot size and to expose a second group of devices having a second alignment on the substrate at a second time period based on the path using a second shot size;
- wherein the stage is configured to move the substrate to align the second group of devices on the substrate between the exposure of the first group of devices and the second group of devices.
A lithography control system comprising:
- at least one processor;
- and
- at least one memory storing instructions that, when executed by the at least one processor, cause the at least one processor to perform operations comprising:
- receiving a recipe;
- based on a path defined in the recipe, exposing, using a projection camera, a first group of devices having a first alignment on the substrate using a first shot size, wherein the substrate is positioned on a stage;
- based on the recipe, moving the stage to align a second group of devices having a second alignment on the substrate;
- and
- based on the path, exposing, using the projection camera, the second group of devices on the substrate using a second shot size.
Dependencies are inferred from the claim text.