Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets
AssigneeASML Netherlands B.V.
InventorsMariya Vyacheslavivna Medvedyeva, Maria Isabel De La Fuente Valentin, Martijn Jongen, Giulio Bottegal, Thomai Zacharopoulou
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Abstract
A recipe selection method includes obtaining measurements from metrology targets, metrology targets positioned on a semiconductor substrate, obtaining measurements from in-device targets, in-device targets positioned on the semiconductor substrate, and determining a recipe for accurate metrology using both metrology target measurements and in-device metrology measurements.
Claims14
A method comprising:
- obtaining measurements from metrology targets, the metrology targets positioned on a substrate outside of areas on the substrate for devices;
- obtaining measurements from in-device targets, the in-device targets positioned on the substrate;
- and
- determining, by a hardware computer system using both the metrology target measurements and in-device metrology measurements, an acquisition profile aspect and/or a substrate layout or sampling scheme aspect, of a recipe for metrology.
A non-transitory computer program product comprising instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
- obtain measurement results from metrology targets, the metrology targets positioned on a substrate outside of areas on the substrate for devices;
- obtain measurement results from in-device targets, the in-device targets positioned on the substrate;
- and
- determine, using both the metrology target measurements and in-device metrology measurements, an acquisition profile aspect and/or a substrate layout or sampling scheme aspect, of a recipe for metrology.
Dependencies are inferred from the claim text.