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US 11,531,268 B2Granted
Positive-working photoresist composition, pattern produced therefrom, and method for producing pattern
AssigneeLG Chem, Ltd.
InventorsMin Young Lim, Tae Seob Lee, Ji Hye Kim
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Abstract
The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.
Claims18
A positive photoresist composition comprising:
- a binder resin comprising a polymer resin having a first repeating unit and an acrylate-based resin having a second repeating unit, the polymer resin having an alkali-soluble functional group introduced into the first repeating unit;
- an oligomer compound having a functional group to which at least one protecting group is introduced;
- and
- a photoacid generator,
- wherein the protecting group is selected from the group of acetal, tert-butyloxycarbonyl, and t-butyl ester,
- wherein the oligomer compound comprises the same first repeating unit as in the polymer resin or the same second repeating unit as in the acrylate-based resin;
- and
- wherein a chain transfer agent represented by the following Chemical Formula 4 is introduced to the end of the repeating unit contained in the oligomer compound:
- wherein, in Chemical Formula 4,
- R9, R10, and R11 are each independently hydrogen, a halogen, or an aliphatic group having 1 to 10 carbon atoms, and
- n6 is an integer, where 1≤n6≤20.
8 more elements
A positive photoresist composition comprising:
- a binder resin comprising a polymer resin having a first repeating unit and an acrylate-based resin having a second repeating unit, the polymer resin having an alkali-soluble functional group introduced into the first repeating unit;
- an oligomer compound having a functional group to which at least one protecting group is introduced;
- and
- a photoacid generator,
- wherein the protecting group is selected from the group of acetal, tert-butyloxycarbonyl, and t-butyl ester,
- wherein the oligomer compound comprises the same first repeating unit as in the polymer resin or the same second repeating unit as in the acrylate-based resin, and
- wherein the oligomer compound is represented by the following Chemical Formula 5:
- wherein e, f, g, and h are each independently an integer of more than 0 and 50 or less.
5 more elements
Dependencies are inferred from the claim text.