Closure mechanism vacuum chamber isolation device and sub-system
AssigneeApplied Materials, Inc.
InventorTuan Anh Nguyen
Life of this patent
Estimating the term…
Abstract
The present disclosure generally relates to an isolation device for use in processing systems. The isolation device includes a body having a flow aperture formed therethrough. In one embodiment, the isolation device is disposed between a remote plasma source and a process chamber. A closure mechanism is pivotally disposed within the body. The closure mechanism can be actuated to enable or disable fluid communication between the remote plasma source and the process chamber. In one embodiment, the closure mechanism includes a shaft and a seal plate coupled to the shaft. A cross-arm is coupled to the shaft opposite the seal plate. The cross-arm is configured to selectively rotate the shaft and the seal plate of the closure mechanism.
Claims19
An isolation device, comprising:
- a body having a flow aperture formed therethrough;
- a cover plate coupled to the body, the cover plate having an opening therethrough and a recess in a surface thereof;
- a closure mechanism pivotally disposed within the body, the closure mechanism comprising:
- a shaft disposed through the opening of the cover plate;
- and
- a seal plate coupled to the shaft;
- a cross-arm coupled to the shaft opposite the seal plate and external of the body, the cross-arm configured to selectively rotate the shaft and the seal plate of the closure mechanism;
- and
- a wheel rotationally coupled to the cross-arm, the wheel disposed in the recess when the seal plate is closed.
An isolation device, comprising:
- a body having a first flow aperture formed therethrough;
- a lower plate coupled to the body;
- a second flow aperture formed through the lower plate, a central axis of the first flow aperture substantially aligned with a central axis of the second flow aperture;
- a cover plate coupled to the body, the cover plate having an opening formed through the cover plate and a recess in surface of the cover plate, the opening parallel to the first flow aperture and the second flow aperture;
- a seal plate volume at least partially defined by the body, the lower plate, and the cover plate;
- a shaft disposed through the opening in the cover plate;
- a seal plate disposed in the seal plate volume and coupled to the shaft, the seal plate having a first surface and a second surface opposite the first surface, the shaft rigidly coupled to the first surface of the seal plate, the seal plate configured to rotate about an axis of the shaft, the seal plate covering the first flow aperture and the second flow aperture when the seal plate is closed;
- a cross-arm coupled to the shaft opposite the seal plate;
- and
- a wheel rotationally coupled to the cross-arm, the wheel disposed in the recess when the seal plate is closed.
A system for processing a substrate, comprising:
- a remote plasma source;
- a process chamber;
- and
- an isolation device disposed between and coupled to the remote plasma source and the process chamber, the isolation device comprising:
- a body having a first flow aperture formed therethrough;
- a lower plate coupled to the body;
- a second flow aperture formed through the lower plate, a central axis of the first flow aperture substantially aligned with a central axis of the second flow aperture;
- a cover plate coupled to the body, the cover plate having an opening formed through the cover plate and a recess in surface of the cover plate, the opening parallel to the first flow aperture and the second flow aperture;
- a seal plate volume at least partially defined by the body, the lower plate, and the cover plate;
- a shaft disposed through the opening in the cover plate;
- a seal plate disposed in the seal plate volume and coupled to the shaft, the seal plate having a first surface and a second surface opposite the first surface, the shaft rigidly coupled to the first surface of the seal plate, the seal plate configured to rotate about an axis of the shaft, the seal plate covering the first flow aperture and the second flow aperture when the seal plate is closed;
- a cross-arm coupled to the shaft opposite the seal plate;
- and
- a wheel rotationally coupled to the cross-arm, the wheel disposed in the recess when the seal plate is closed.
Dependencies are inferred from the claim text.