Cycloheptatriene molybdenum (0) precursors for deposition of molybdenum films
AssigneeApplied Materials, Inc.
InventorsAndrea Leoncini, Paul Mehlmann, Nemanja Dordevic, Han Vinh Huynh, Doreen Wei Ying Yong
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Abstract
Molybdenum(0) coordination complexes comprising at least one cycloheptatriene ligand and optionally one or more neutral ligands which coordinate to the metal center by carbon, nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
Claims17
A metal coordination complex comprising molybdenum(0), at least one cycloheptatriene ligand substituted with one or more alkyl group and optionally one or more neutral ligands, each neutral ligand coordinated by carbon, nitrogen or phosphorous, wherein the metal coordination complex has less than 1% halide and carbonyl groups on an atomic basis and no neutral ligand is coordinated by phosphorus if the ligand is monodentate.
Dependencies are inferred from the claim text.