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US 11,530,375 B2Granted
Substrate cleaning compositions, substrate cleaning method and substrate treating apparatus
AssigneeSemes Co., Ltd.
InventorsHae-Won Choi, Kihoon Choi, Jaeseong Lee, Chan Young Heo, Anton Koriakin, Do Heon Kim, Ji Soo Jeong
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Abstract
A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.
Claims8
A method of processing a substrate, the method comprising:
- rotating the substrate;
- applying a cleaning composition to the substrate while the substrate is rotated, the cleaning composition including an organic solvent having a Hansen solubility parameter for polystyrene latex between 5 and 12;
- and
- supplying a processing fluid comprising a mixture of the cleaning composition and a supercritical fluid to the substrate to which the cleaning composition was applied to process the substrate,
- wherein the cleaning composition is provided by dissolving an etching compound comprising fluorine in the organic solvent, and
- wherein the cleaning composition further includes a binder comprising a compound including phosphorus.
3 more elements
Dependencies are inferred from the claim text.