MEMs membrane structure and method of fabricating same
AssigneeKorea Advanced Institute of Science and Technology
InventorsBoung Ju Lee, Boo Taek Lim
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Abstract
Disclosed is a method of fabricating a MEMS membrane structure. The method comprises: forming a silicon oxide film dam structure on a silicon substrate; depositing an adhesive layer and then forming a sacrificial layer; depositing a surface protective film on the sacrificial layer; etching the surface protective film and the sacrificial layer, thus forming trenches of first to third rows on the silicon oxide film dam structure; depositing a support film inside of the trenches of first to third rows and on the surface protective film of the sacrificial layer, thus forming a membrane; and removing the sacrificial layer disposed inside the support film deposited inside of the trench of first row, thus forming an empty space.
Claims6
A MEMS membrane structure, comprising:
- a silicon substrate;
- a silicon oxide film dam structure formed on the silicon substrate in a polygonal or circular cylindrical shape;
- a membrane formed by depositing a support film on a sacrificial layer and inside of a plurality of trenches formed from the sacrificial layer in a polygonal or circular cylindrical shape on top of the silicon oxide film dam structure;
- and
- an empty space formed by removing only a central portion of the sacrificial layer disposed inside the support film deposited between the plurality of trenches, and the portions of the sacrificial layer surrounding the trenches remain.
Dependencies are inferred from the claim text.