Three-dimensional beam forming x-ray source
AssigneeEmpyrean Medical Systems, Inc.
InventorsKalman Fishman, Brian P. Wilfley, Christopher W. Ellenor, Donald Olgado, Chwen-Yuan Ku, Tobias Funk, Petre Vatahov, Christopher R. Mitchell
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Abstract
X-ray target element is comprised of a planar wafer. The planar wafer element includes a target layer and a substrate layer. The target layer is comprised of an element having a relatively high atomic number and the substrate layer is comprised of diamond. The substrate layer is configured to support the target layer and facilitate transfer of thermal energy away from the target layer.
Claims20
A method for generating X-ray photons, comprising:
- generating an electron beam;
- positioning a planar target element wafer in the path of the electron beam;
- generating X-ray radiation as a result of an interaction of the electron beam with a target layer of the target element wafer;
- causing the X-ray radiation to interact with a beam shield comprising a plurality of wall elements extending transversely from a face of the target element wafer;
- variably controlling at least one of a beam shape and direction of the X-ray radiation by selectively controlling a location where the electron beam intersects the target layer;
- and
- facilitating transfer of thermal energy away from the target layer using a substrate layer on which the target layer is disposed.
A method for generating X-ray photons, comprising:
- generating an electron beam;
- positioning a planar target element wafer in the path of the electron beam;
- generating X-ray photons as a result of an interaction of the electron beam with a target layer of the target element wafer;
- causing the X-ray photons to interact with a beam shield comprising a plurality of wall elements extending transversely from a face of the target element wafer;
- variably controlling at least one of a beam shape and direction formed by the X-ray photons by selectively controlling a location where the electron beam intersects the target layer;
- and
- facilitating transfer of thermal energy away from the target layer using a substrate layer formed of diamond on which the target layer is disposed.
An X-ray target, comprising:
- a planar wafer comprising a target layer and a substrate layer;
- the target layer comprised of an element having a relatively high atomic number;
- the substrate layer transmissive of X-ray photons and configured to support the target layer;
- a beam shield comprising a plurality of wall elements extending transversely from a face of the planar wafer;
- wherein the substrate layer is comprised of a material which has high thermal conductivity to facilitate transfer of thermal energy away from the target layer, and the beam shield is configured to facilitate variable control of at least one of a shape and direction of an X-ray beam produced by the X-ray target responsive to an electron beam intersecting the target layer at a plurality of different locations.
An X-ray target, comprising:
- a planar wafer comprising a target layer and a substrate layer;
- the target layer comprised of an element having an atomic number greater than 21;
- the substrate layer comprised of diamond;
- a beam shield comprising a plurality of wall elements extending transversely from a face of the planar wafer;
- wherein the substrate layer is configured to support the target layer and facilitate transfer of thermal energy away from the target layer, and the beam shield is configured to facilitate variable control of at least one of a shape and direction of an X-ray beam produced by the X-ray target responsive to a location where an electron beam intersects the target layer.
Dependencies are inferred from the claim text.