Fluid composition and method for conducting a material removing operation
AssigneeSaint-Gobain Ceramics & Plastics, Inc.
InventorsLin Fu, Jason A. Sherlock, Long Huy Bui, Douglas E. Ward
Life of this patent
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Abstract
A fluid composition suitable for chemical mechanical polishing a substrate can in include a multi-valent metal borate, at least one oxidizer, and a solvent. The fluid composition can be essentially free of abrasive particles and may achieve a high material removal rate and excellent surface finish.
Claims17
A fluid composition comprising:
- a multi-valent metal borate;
- at least one oxidizing agent;
- and a solvent, wherein
- the multi-valent metal borate includes iron(III)borate, copper(II)borate, or a combination thereof;
- the oxidizing agent includes a permanganate salt in an amount of at least 1 wt % to not greater than 20 wt % based on the total weight of the fluid composition;
- and
- a pH of the fluid composition is not greater than 5.
A method of polishing a substrate, comprising:
- providing a fluid composition, wherein the fluid composition comprises a multi-valent metal borate, at least one oxidizing agent and water;
- bringing the fluid composition in contact with the substrate and a polishing pad;
- and
- polishing the substrate,
- wherein the multi-valent metal borate includes iron(III)borate, copper(II)borate, or a combination thereof;
- and the oxidizing agent includes a permanganate salt in an amount of at least 1 wt % and not greater than 10 wt %, and a pH of the fluid composition is not greater than 5.
A kit adapted for preparing a fluid for polishing a substrate, the kit comprising a first package and a second package, wherein the first package comprises a multi-valent metal salt, wherein an anion of the multi-valent metal salt includes nitrate, chloride, bromide, iodide, sulfate, phosphate, or any combination thereof;
- the second package comprises boric acid;
- the first package or the second package further comprise at least one oxidizing agent, the oxidizing agent including a permanganate salt;
- and
- the kit is adapted for preparing a fluid for polishing a substrate
- wherein an amount of the permanganate salt of the fluid after combining the first and the second package is at least 1 wt % and not greater than 10 wt %, and a pH of the fluid is not greater than 5.
Dependencies are inferred from the claim text.